Plasmid-determined resistance to tellurium compounds

Tellurium and tellurium compounds

Plasmid-determined resistance to boron and chromium compounds in Pseudomonas aeruginosa.

Plasmids determining resistance to arsenic, mercury, silver, and tellurium compounds in Escherichia coli and Pseudomonas aeruginosa were tested for resistance to 40 other metal compounds. Resistance to trivalent boron and hexavalent chromium compounds was a property of certain P. aeruginosa plasmids.

Plasmid-determined resistance to hexachlorophene in Pseudomonas aeruginosa.

Plasmid-containing strains of Pseudomonas aeruginosa were screened for resistance to disinfectants. Two plasmids, pMG1 and pMG2, were found to determine hexachlorophene resistance.

Plasmid-determined epistatic susceptibility to kasugamycin.

The effect of two representative plasmids, R100 and F8-gal, on the susceptibility of Escherichia coli to kasugamycin was studied. R(+) and F(+) cells were found to be more susceptible to this antibiotic than R(-) and F(-) cells, respectively. Retransfer and curing experiments of these plasmids show that this increased susceptibility of host cells to kasugamycin was conferred by either of the pl...

Inducible plasmid-determined resistance to arsenate, arsenite, and antimony (III) in escherichia coli and Staphylococcus aureus.

Plasmids in both Escherichia coli and Staphylococcus aureus contain an "operon" that confers resistance to arsenate, arsenite, and antimony(III) salts. The systems were always inducible. All three salts, arsenate, arsenite, and antimony(III), were inducers. Mutants and a cloned deoxyribonucleic acid fragment from plasmid pI258 in S. aureus have lost arsenate resistance but retained resistances ...